1.

Conference Proceedings
Conference Proceedings
1. Low Damage And Selective Etching of GaAs Using BCl3/SF6 Gas in ECR Plasma
Oikawa, H. ; Kohno, M. ; Mochizuki, A. ; Nashimoto, Y.
Pub. info.: Proceedings of the Twenty-fourth State-of-the-Art Program on Compound Semiconductors.  pp.246-252,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-2
2.

Conference Proceedings
Conference Proceedings
2. Preparation of highly ordered MCM-41 with docosyltrimethylammonium chloride (C22TMACl) as a template and fine control of its pore size
Namba, S. ; Mochizuki, A. ; Kito, M.
Pub. info.: Mesoporous molecular sieves 1998 : proceedings of the first international symposium, Baltimore, MD, U.S.A., July 10-12, 1998.  pp.257-,  1998.  Amsterdam.  Elsevier
Title of ser.: Studies in surface science and catalysis
Ser. no.: 117