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19 results

Conference Proceedings

1. Progress of light source technologies from KrF laser to F2 laser

Mizoguchi,H.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.305-312, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. Virtual video tape:a novel development tool real-time motion image understanding

Parallel and distributed methods for image processing IV

Pub. info.:	Parallel and distributed methods for image processing. pp.30-37, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4118

Conference Proceedings

3. High-resolution multigrating spectrometer for high-quality deep-UV light source production

Suzuki,T. ; Nakaike,T. ; Wakabayashi,O. ; Mizoguchi,H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1452-1460, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

4. Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography

Enami,T. ; Wakabayashi,O. ; Ishii,K. ; Terashima,K. ; Itakura,Y. ; Watanabe,T. ; Ohta,T. ; Ohbu,A. ; Kubo,H. ; Tanaka,H. ; Suzuki,T. ; Sumitani,A. ; Mizoguchi,H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1435-1444, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

5. Output stabilization technology With chemical impurity control on ArF excimer laser

Sumitani,A. ; Andou,S. ; Watanabe,T. ; Konishi,M. ; Egawa,S. ; Uchino,I. ; Ohta,T. ; Terashima,K. ; Suzuki,N. ; Enami,T. ; Mizoguchi,H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1424-1434, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. In-situ measurement of VUV optical materials under F2 laser irradiation

Itakura,Y. ; Sumitani,A. ; Yoshida,F. ; Kawasa,Y. ; Zhang,J. ; Wakabayashi,O. ; Mizoguchi,H.

Pub. info.:	Second International Symposium on Laser Precision Microfabrication : 16-18 May 2001, Singapore. pp.475-478, 2001. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4426

Conference Proceedings

7. Evaluation of characteristics of VUV optical materials irradiated by F2 laser

Itakura,Y. ; Yoshida,F. ; Kawasa,Y. ; Sumitani,A. ; Wakabayashi,O. ; Mizoguchi,H.

Pub. info.:	First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan. pp.205-208, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4088

Conference Proceedings

8. Ultra-line-narrowed F2 laser for microlithography

Komori,H. ; Ariga,T. ; Watanabe,H. ; Kumazaki,T. ; Kitatochi,N. ; Sasano,K. ; Ueno,Y. ; Nishisaka,T. ; Nohdomi,R. ; Hotta,K. ; Mizoguchi,H. ; Nakao,K.

Pub. info.:	Second International Symposium on Laser Precision Microfabrication : 16-18 May 2001, Singapore. pp.424-428, 2001. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4426

Conference Proceedings

9. High-repetition-rate fluorine laser for microlithography

Fujimoto,J. ; Nagai,S. ; Shio,K. ; Iwata,Y. ; Takehisa,K. ; Nishisaka,T. ; Wakabayashi,O. ; Mizoguchi,H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1560-1567, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

10.

Conference Proceedings

10. Interruption-free construction of a firewall for research network

Mizoguchi,H. ; Teshiba,M. ; Hiraoka,K. ; Shigehara,T. ; Mishima,T.

Pub. info.:	Critical technologies for the future of computing : 31 July-4 August 2000, San Diego, USA. pp.289-295, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4109

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