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Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.497-504, 2005. Pennington, NJ. Electrochemical Society
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Opto-Ireland 2005: Optoelectronics, Photonic Devices, and Optical Networks. pp.364-369, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Opto-Ireland 2005: Optoelectronics, Photonic Devices, and Optical Networks. pp.29-36, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering