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Landau, S. A. ; Weiss, P-A. ; Junghans, N. ; Kolbesen, B. O. ; Adderton, D. ; Schindler, G. ; Hartner, W. ; Hintermaier, F. ; Dehm, C. ; Mazure, C.
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Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.567-, 1999. Warrendale, PA. MRS - Materials Research Society