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11 results

Conference Proceedings

1. Interference Effect of Adjacent Patterns - Copper Electrodeposition

Kondo, K. ; Fukui, K. ; Maruyama, S.

Pub. info.:	Electrochemical science and technology of copper : proceedings of the international symposium. pp.71-76, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-30

Conference Proceedings

2. Chemical Reaction of Metal-Carbon Binary Cluster Anions by FT-ICR Mass Spectrometer.

Maruyama, S. ; Kohno, M. ; Inoue, S.

Pub. info.:	Fullerenes 2000 : chemistry and physics of fullerenes and carbon nanomaterials, proceedings of the International Symposium. pp.309-319, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-12

Conference Proceedings

3. Computational analysis of electric field distribution in dual-layered phase-change disc

Maruyama, S. ; Hirono, M. ; Yusu, K. ; Tsukamoto, T. ; Morishita, N. ; Tanaka, M. ; Satoh, H.

Pub. info.:	Optical data storage 2003 : 11-14 May 2003, Vancouver, British Columbia, Canada. pp.190-195, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5069

Conference Proceedings

4. 60-nm gate length SOI CMOS technology optimised for 'System-on-a-SOI-chip' solution

Imai, K. ; Maruyama, S. ; Suzuld, T. ; Kudo, T. ; Miyake, S. ; Ikeda, M. ; Abe, T. ; Masuda, S. ; Tanabe, A. ; Lee, J-W. ; Shibahara, K. ; Yokoyania, S. ; Qoka, H.

Pub. info.:	Silicon-on-insulator technology and devices XI : proceedings of the international symposium. pp.149-158, 2003. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-5

Conference Proceedings

5. 60-nm Gate Length SOI CMOS Technology Optimized for 'System-on-a- SOI-Chip' Solution*

Imai, K. ; Maruyama, S. ; Suzuki, T. ; Kudo, T. ; Miyake, S. ; Ikeda, M. ; Abe, T. ; Masuda, S. ; Tanabe, A. ; Lee, J.-W. ; Shibahara, K. ; Yokoyama, S. ; Ooka, H.

Pub. info.:	ULSI Process Integration : proceedings of the International Symposium. pp.493-502, 2003. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-6

Technical Paper

6. Feasibility Study of a New Optimization Technique for the Vehicle Body Structure in the Initial Phase of the Design Process.

Yamamoto, T. ; Maruyama, S. ; Yamada, H. ; Nishiwaki, S.

Pub. info.:	2007 SAE Noise and Vibration Conference and Exhibition : technical paper. 2007. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2007

Technical Paper

7. Load Path Analysis of Vehicle Body Structures under Eigenmode Deformation of Bending Vibration.

Okano, Y. ; Matsunaga, T. ; Maruyama, S. ; Hanazato, M. ; Takahashi, K.

Pub. info.:	2009 SAE world congress : technical paper. 2009. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2009

Conference Proceedings

8. EPL stencil mask defect inspection system using transmission electron beam

Yamamoto, J. ; Iwasaki, T. ; Yamabe, M. ; Anazawa, N. ; Maruyama, S. ; Tsuta, K.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.531-537, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

9. Stencil mask defect inspection system and advanced application

Maruyama, S. ; Harada, N. ; Yamamoto, J. ; Nakamura, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.890-896, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

10.

Conference Proceedings

10. A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Iwase, K. ; Omori, S. ; Nohama, S. ; Yotsui, K. ; Suzuki, G. ; Sasaki, Y. ; Itoh, K. ; Tamura, A. ; Maruyama, S. ; Moriya, S. ; Kitagawa, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.915-922, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

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