Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

13 results

Conference Proceedings

1. Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA

Arthur,G.G. ; Martin,B.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.209-220, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. Progress of the MMT adaptive optics program

Wildi,F.P. ; Brusa,G. ; Riccardi,A. ; Allen,R.G. ; Lloyd-Hart,M. ; Miller,D. ; Martin,B. ; Biasi,R. ; Gallieni,D.

Pub. info.:	Adaptive optics systems and technology II : 30 July-1 August 2001, San Diego, USA. pp.11-18, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4494

Conference Proceedings

3. Pitch-dependent intrafield dimensional offsets in advanced lithography

Wallace,C. ; Martin,B. ; Arthur,G.G.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.656-662, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

4. Metric for process optimization on substrates with transparent stacks in optical lithography

Martin,B. ; Arthur,G.G.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.641-647, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

5. Optimum design for optical proximity correction in submicron bipolar technology using critical shape error analysis

Arthur,G.G. ; Martin,B. ; Wallace,C.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.631-640, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

6. Stepper lens field critical dimension uniformity and optical proximity correction

Martin,B.

Pub. info.:	Process and equipment control in microelectronic manufacturing II : 30-31 May, 2001, Edinburgh, UK. pp.100-104, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4405

Conference Proceedings

7. Some measurements on the effects of developer depletion

Martin,B. ; Tighe,T.

Pub. info.:	Process and equipment control in microelectronic manufacturing II : 30-31 May, 2001, Edinburgh, UK. pp.142-147, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4405

Conference Proceedings

8. Application of optical proximity correction in manufacturing and its effect on process control

Wallace,C. ; Duncan,C. ; Martin,B.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.663-670, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Technical Paper

9. Numerical Study of Zinc Coated Car Body Laser Welding

Loredo,A. ; Martin,B. ; Andrzejewski,H. ; Pilloz,M. ; Grevey,D. ; Habert,P. ; Goby,L. ; Joly,M.

Pub. info.:	Manufacturing. pp.59-64, 2001. Warrendale, Pa.. Society of Automotive Engineering, Inc.
Title of ser.:	SAE publication
Ser. no.:	P-369

10.

Conference Proceedings

10. Optimizaion of dielectric antireflective coatings on a transparent substrate in sub-half-micron CMOS technology

Arthur,G.G. ; Martin,B. ; Wallace,C.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XV. pp.644-652, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

13 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by: