1.

Conference Proceedings
Conference Proceedings
1. Toward a universal resist dissolution model for lithography simulation
Robertson,S.A. ; Mack,C.A. ; Maslow,M.J.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.111-122,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Measurement and analysis of reticle and wafer-level contributions to total CD variation
Preil,M.E. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.144-152,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
3.

Conference Proceedings
Conference Proceedings
3. Analytic approach to understanding the impact of mask errors on optical lithography
Mack,C.A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.215-227,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Modeling of projection electron lithography
Mack,C.A.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.245-254,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
5.

Conference Proceedings
Conference Proceedings
5. Modeling the effects of excimer laser bandwidths on lithographic performance
Kroyan,A. ; Bendik,J.J. ; Semprez,O. ; Farrar,N.R. ; Rowan,C.G. ; Mack,C.A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.658-664,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
6.

Conference Proceedings
Conference Proceedings
6. Automatic calibration of lithography simulation parameters
Jug,S. ; Huang,R. ; Byers,J.D. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.380-395,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
7.

Conference Proceedings
Conference Proceedings
7. Development of analysis system for F2-excimer laser photochemical processes
Sekiguchi,A. ; Kadoi,M. ; Miyake,Y. ; Matsuzawa,T. ; Mack,C.A.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.395-412,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
8.

Conference Proceedings
Conference Proceedings
8. Measurement and analysis of reticle and wafer-level contributions to total CD variation
Preil,M. ; Mack,C.A.
Pub. info.: Microlithographic Techniques in Integrated Circuit Fabrication II.  pp.169-177,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4226
9.

Conference Proceedings
Conference Proceedings
9. Corner rounding and line-end shortening in optical lithography
Mack,C.A.
Pub. info.: Microlithographic Techniques in Integrated Circuit Fabrication II.  pp.83-92,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4226
10.

Conference Proceedings
Conference Proceedings
10. Impact of illumination coherence and polarization on the imaging of attenuated phase-shift masks
Ma,Z.M. ; Mack,C.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.1522-1532,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346