1.

Conference Proceedings
Conference Proceedings
1. Method of easily extracting resist development parameters for lithography simulation
Lucas,K.D. ; Ivin,V.V. ; Kudrja,V.P. ; Larin,D.Yu. ; Makhviladze,T.M. ; Medvedeva,M.G. ; Rogov,A.A. ; Verzunov,S.V. ; Yang,D.C.
Pub. info.: Optical Microlithography IX.  Part1  pp.348-359,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
2.

Conference Proceedings
Conference Proceedings
2. Efficient workstation-based 3D model for optical alignment simulation
Lucas,K.D. ; Yuan,C.-M. ; Strojwas,A.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.436-447,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725