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10 results

Conference Proceedings

1. Reduction of wafer-scale error between DI and FI in multilevel metallization hy adjusting edge detedion method

Bae,S.-G. ; Kim,Y.-K. ; Park,K.-Y. ; Kim,J.-S. ; Lee,W.-G. ; Lee,S.-W. ; Lee,D.-H.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.460-469, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

2. High-density optical disk readout using a blue laser diode and a transparent plastic substrate with 0.3-mm thickness

Park,K.-C. ; Lee,T.-S. ; Kim,H.-N. ; Jeong,S.-Y. ; Ahn,S.-K. ; Kim,J.-Y. ; Lee,J.-S. ; Kim,J.-B. ; Lee,S.-W. ; Lee,D.-C. ; Asai,I.

Pub. info.:	Optical data storage 2000 : 14-17 May, 2000, Whistler, Canada. pp.43-47, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4090

Conference Proceedings

3. Improvement of resist profile roughness in bilayer resist process

Jeong,C.-Y. ; Ryu,S. ; Park,K.-Y. ; Lee,W.G. ; Lee,S.-W. ; Lee,D.-H.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.818-826, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

4. Doubly exposed patterning characteristics using two alternating phase-shift masks

Lee,S.-W. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.32-36, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

5. Analysis of dry etch loading effect in mask fabrication

Lee,J.-Y. ; Cho,S.-Y. ; Kim,C.-H. ; Lee,S.-W. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.609-615, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

6. Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Lee,S.-W. ; Chung,D.-H. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	Optical Microlithography XIV. 4346 pp.762-769, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

7. Improvement of defect density for DUV halftone PSM

Lee,K.-Y. ; Kim,L.-J. ; Yeon,K.-M. ; Lee,S.-W. ; Kim,H.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.388-393, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

8. Effect of mask reduction ratio in alternating phase-shift masks

Shin,I.-G. ; Lee,S.-W. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M. ; Lim,T.-K.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.309-315, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

9. Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography

Nam,K.-H. ; Kim,L.-J. ; Jeong,H.-S. ; Lee,S.-W. ; Lee,I.-S. ; Shin,C. ; Kim,H.-S. ; Dieu,L. ; Paek,S.W. ; Koo,S.-S. ; Bae,S.-M. ; Ham,Y.-M. ; Shin,K.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.70-80, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

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Conference Proceedings

10. Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base

Hinsberg,W.D. ; Lee,S.-W. ; Ito,H. ; Horne,D.E. ; Kanazawa,K.K.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.1-9, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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