1.

Conference Proceedings
Conference Proceedings
1. Practical approach to control the full-chip-level gate CD in DUV lithography
Park,C.-H. ; Kim,Y.-H. ; Lee,H.-J. ; Kong,J.-T. ; Lee,S.-H.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.215-223,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Polymeric 1 ｡ﾟ 8 arrayed waveguide grating wavelength multiplexer using fluorinated poly(ether ketone)at 1550 nm
Ahn,J.-H. ; Lee,H.-J. ; Hwang,W.-Y. ; Lee,M.-H. ; Han,S.G.
Pub. info.: Terahertz and gigahertz photonics : 19-23 July 1999, Denver, Colorado.  pp.568-575,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3795
3.

Conference Proceedings
Conference Proceedings
3. Error concealment algorithm for wavelet-coded images over packet-switched networks
Lee,H.-J. ; Liu,J.-C.S. ; Chan,A.K. ; Chui,C.K.
Pub. info.: Multimedia computing and networking 1996 : 29-31 January 1996, San Jose, California.  pp.222-233,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2667
4.

Conference Proceedings
Conference Proceedings
4. Three-dimensional electron-beam lithography simulator V2.O for the gigabit-era photomask manufacturing
Kim.Y.-H ; Cha.B.-C ; Lee,H.-J. ; Sohn,J.-M. ; Kong,J.-T. ; Lee,S.-H.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.358-365,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236