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15 results

Conference Proceedings

1. Laser alignment strictness for optical diffraction effect in lithography processes

Lin,H.-P. ; Lee,C.-H. ; Lo,Y.-C. ; Lu,K.L.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.986-996, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

2. Expanded nonlinear order dithering and modified error diffusion for an ink-jet color printer

Lee,C.-S. ; Lee,C.-H. ; Park,Y.-W. ; Ha,Y.-H.

Pub. info.:	Color imaging : device-independent color, color hardcopy, and graphic arts IV : 26-29 January 1999, San Jose, California. pp.541-550, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3648

Conference Proceedings

3. Nitride film surface properties to reduce nitride residue

Weng,F.T. ; Lee,C.-H. ; Lu,K.-L. ; Chyn,Y.-P.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.675-685, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

4. Optimizing the clean effect of wafer backside in lithography developer process

Lin,H.-P. ; Chang,C.-H. ; Lee,C.-H. ; Pang,S.L. ; Lu,K.L.

Pub. info.:	Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California. pp.193-199, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3882

Conference Proceedings

5. Relation between film character and wafer alignment: critical alignment issues on HV device for VLSI manufacturing

Lo,Y.-C. ; Lee,C.-H. ; Lin,H.-P. ; Peng,C.-S.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.686-695, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

6. Transmission of Directly Modulated 10Gb/s Signals over 340km of Non-Dispersion Shifted Fiber by Mid-Span Spectral Inversion,

Lee,S.-S. ; Lee,C.-H.

Pub. info.:	Optics for science and new technology : 17th Congress of the International Commission for Optics, August 19-23, 1996, Hotel Riviera(Yusong), Taejon Korea. Part1 pp.149-150, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2778

Conference Proceedings

7. Design criteria of buckling microbridges

Fang,W. ; Hu,H. ; Lee,C.-H.

Pub. info.:	Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California. pp.288-296, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3511

Conference Proceedings

8. Comparison of best process focus and machine focus

Lo,Y.-C. ; Lee,C.-H. ; Fan,Y.-T. ; Chang,C.-K. ; Lu,K.L.

Pub. info.:	Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III. pp.241-248, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3213

Conference Proceedings

9. Tracing metal defect relating to yield for VLSI manufacturing

Loe,Y.-C. ; Lee,C.-H. ; Lin,C.-C. ; Yang,C.-M. ; Lu,K.L. ; Yang,J.J.

Pub. info.:	Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II. pp.45-56, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2876

10.

Conference Proceedings

10. Best process focus and machine focus: adding focus offset to optimize photolithography process for VLSI manufacturing

Lo,Y.-C. ; Lee,C.-H. ; Fan,Y.-T. ; Chang,C.-K.

Pub. info.:	Microlithographic Techniques in IC Fabrication. pp.186-195, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3183

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