1.

Conference Proceedings
Conference Proceedings
1. Stability issues in the use of coherent x-rays
Nishino, Y. ; Kudo, T. ; Suzuki, M. ; Ishikawa, T.
Pub. info.: Crystals, multilayers, and other synchrotron optics : 5 August 2003, San Diego, California, USA.  pp.94-103,  2003.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5195
2.

Conference Proceedings
Conference Proceedings
2. 60-nm gate length SOI CMOS technology optimised for 'System-on-a-SOI-chip' solution
Imai, K. ; Maruyama, S. ; Suzuld, T. ; Kudo, T. ; Miyake, S. ; Ikeda, M. ; Abe, T. ; Masuda, S. ; Tanabe, A. ; Lee, J-W. ; Shibahara, K. ; Yokoyania, S. ; Qoka, H.
Pub. info.: Silicon-on-insulator technology and devices XI : proceedings of the international symposium.  pp.149-158,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-5
3.

Conference Proceedings
Conference Proceedings
3. 60-nm Gate Length SOI CMOS Technology Optimized for 'System-on-a- SOI-Chip' Solution*
Imai, K. ; Maruyama, S. ; Suzuki, T. ; Kudo, T. ; Miyake, S. ; Ikeda, M. ; Abe, T. ; Masuda, S. ; Tanabe, A. ; Lee, J.-W. ; Shibahara, K. ; Yokoyama, S. ; Ooka, H.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.493-502,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of zernike sensitivity method for CD distribution
Nakashima, T. ; Slonaker, S.D. ; Kudo, T. ; Hirukawa, S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1600-1610,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Simulation benchmarking
Tyminski, J.K. ; Nakashima, T. ; Kudo, T. ; Slonaker, S.D. ; Hirukawa, S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1544-1555,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography
Hong, S. ; Takano, Y. ; Kanda, T. ; Kudo, T. ; Padmanaban, M. ; Tanaka, H. ; Lee, S.-H. ; Lee, J.-H. ; Woo, S.-G.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.195-206,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
7.

Conference Proceedings
Conference Proceedings
7. PEB sensitivity studies of ArF resist
Lee, S.H. ; Kim, W.-K. ; Rahman, D.M. ; Kudo, T. ; Timko, A. ; Anyadiegwu, C. ; McKenzie, D.S. ; Kanda, T. ; Dammel, R.R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.798-806,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
8.

Conference Proceedings
Conference Proceedings
8. Performance of imide and methide onium PAGs in 193-nm resist formulations
Padmanaban, M. ; Dammel, R.R. ; Lee, S.H. ; Kim, W.-K. ; Kudo, T. ; McKenzie, D.S. ; Rahman, D.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.743-751,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039