1.

Conference Proceedings
Conference Proceedings
1. In Situ Growth-Stress Measurement of Cr2O3 Scale Formed on Stainless Steels by Raman Spectroscopy
Kitamura, K. ; Nishiyama, Y. ; Otsuka, N. ; Kudo, T.
Pub. info.: High-temperature oxidation and corrosion 2005 : proceedings of the International Symposium on High-Temperature Oxidation and Corrosion 2005 , Nara, Japan, 30th November - 2nd December 2005.  pp.489-496,  2006.  Uetikon-Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 522-523
2.

Conference Proceedings
Conference Proceedings
2. Strongly (111) oriented metallization by ion plating method
Kudo, T. ; Sakuragi, S. ; Masui, S. ; Kinoshita, K. ; Makino, H. ; Tanaka, M.
Pub. info.: New methods, mechanisms and models of vapor deposition : symposium held April 24-26, 2000, San Francisco, California, U.S.A..  pp.205-,  2000.  Warrendale, PA.  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 616
3.

Conference Proceedings
Conference Proceedings
3. Stability issues in the use of coherent x-rays
Nishino, Y. ; Kudo, T. ; Suzuki, M. ; Ishikawa, T.
Pub. info.: Crystals, multilayers, and other synchrotron optics : 5 August 2003, San Diego, California, USA.  pp.94-103,  2003.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5195
4.

Conference Proceedings
Conference Proceedings
4. 60-nm gate length SOI CMOS technology optimised for 'System-on-a-SOI-chip' solution
Imai, K. ; Maruyama, S. ; Suzuld, T. ; Kudo, T. ; Miyake, S. ; Ikeda, M. ; Abe, T. ; Masuda, S. ; Tanabe, A. ; Lee, J-W. ; Shibahara, K. ; Yokoyania, S. ; Qoka, H.
Pub. info.: Silicon-on-insulator technology and devices XI : proceedings of the international symposium.  pp.149-158,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-5
5.

Conference Proceedings
Conference Proceedings
5. Recent Advances in Lithium-Based Complex Hydrides for Solid-State Hydrogen Storage
Nakamori, Y. ; Kitahara, G. ; Kudo, T. ; Yamagishi, T. ; Orimo, S.
Pub. info.: PRICM 5 : the Fifth Pacific Rim International Conference on Advanced Materials and Processing, November 2-5, 2004, Beijing, China.  pp.2431-2436,  2005.  Uetikon-Zuerich.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 475-479(3)
6.

Conference Proceedings
Conference Proceedings
6. 60-nm Gate Length SOI CMOS Technology Optimized for 'System-on-a- SOI-Chip' Solution*
Imai, K. ; Maruyama, S. ; Suzuki, T. ; Kudo, T. ; Miyake, S. ; Ikeda, M. ; Abe, T. ; Masuda, S. ; Tanabe, A. ; Lee, J.-W. ; Shibahara, K. ; Yokoyama, S. ; Ooka, H.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.493-502,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
7.

Conference Proceedings
Conference Proceedings
7. Phase transition and control of self-assembled mesostructured vanadia/surfactant composites
Honma, I. ; Yagi, Y. ; Zhou, H. S. ; Endo, A. ; Miyayama, M. ; Kudo, T.
Pub. info.: Nanophase and nanocomposite materials III : symposium held November 29-December 2, 1999, Boston, Massachusetts, U.S.A..  pp.429-,  2000.  Pittsburgh, Pa..  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 581
8.

Technical Paper
Technical Paper
8. Heat Transfer Characteristics of an Integrated Cooling Configuration for Ultra-High Temperature Turbine Blades: Experimental and Numerical Investigations.
Funazaki, K. ; Tarukawa, Y. ; Kudo, T. ; Matsuno, S. ; Imai, R. ; Yamawaki, S.
Pub. info.: A.S.M.E. paper.  2001.  New York, NY.  American Society of Mechanical Engineers
Title of ser.: ASME Technical Paper : GT
Ser. no.: 2001
9.

Technical Paper
Technical Paper
9. Correlation Between Fluctuations of Mass Flux and Hydrogen Concentration in Supersonic Mixing
Arai, T. ; Mizobata, K. ; Minato, R. ; Tanatsugu, N. ; Mori, Y. ; Kudo, T.
Pub. info.: AIAA meeting papers on disc.  2005.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : International Space Planes and Hypersonic Systems and Technologies Conference
Ser. no.: 13th
10.

Conference Proceedings
Conference Proceedings
10. Three-dimensional interactive processor which processes 64 directional images
Kudo, T. ; Takaki, Y.
Pub. info.: Three-Dimensional TV, Video, and Display III.  pp.16-23,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5599
11.

Conference Proceedings
Conference Proceedings
11. Study of the effect of amine additives on LWR and LER [6153-44]
Houlihan, F. M. ; Rentkiewicz, D. ; Lin, G. ; Rahman, D. ; Mackenzie, D. ; Timko, A. ; Kudo, T. ; Anyadiegwu, C. ; Thiyagarajan, M. ; Chiu, S. ; Romano, A. ; Dammel, R. R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615317-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
12.

Conference Proceedings
Conference Proceedings
12. Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]
Kudo, T. ; Lin, G. ; Lee, D. ; Rahman, D. ; Timko, A. ; Mckenzie, D. ; Anyadiegwu, C. ; Chiu, S. ; Houlihan, F. ; Rentkiewicz, D. ; Dammel, R. R. ; Padmanaban, M. ; Biafore, J.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61532C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
13.

Conference Proceedings
Conference Proceedings
13. Effects of laser bandwidth on OPE in a modern lithography tool [6154-36]
Huggins, K. ; Tsuyoshi, T. ; Ong, M. ; Rafac, R. ; Treadway, C. ; Choudhary, D. ; Kudo, T. ; Hirukawa, S. ; Renwick, S. P. ; Farrar, N. R.
Pub. info.: Optical Microlithography XIX.  pp.61540Z-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
14.

Conference Proceedings
Conference Proceedings
14. A narrow-spectrum long-wavelength VCSEL using a fiber Bragg grating [6351-13]
Mizunami, T. ; Kojima, S. ; Kudo, T.
Pub. info.: Passive Components and Fiber-based Devices III.  pp.63510C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6351
15.

Conference Proceedings
Conference Proceedings
15. E-beam curing effects on the etch and CD-SEM stability of 193-nm resists
Padmanaban, M. ; Alemy, E. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; McKenzie, D.S. ; Orsi, A. ; Rahman, D. ; Chen, W.-L. ; Sadjadi, R.M. ; Livesay, W.R. ; Ross, M.F.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.606-614,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
16.

Conference Proceedings
Conference Proceedings
16. Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
Dammel, R.R. ; Sakamuri, R. ; Lee, S.-H. ; Rahman, M.D. ; Kudo, T. ; Romano, A.R. ; Rhodes, L.F. ; Lipian, J. ; Hacker, C. ; Barnes, D.A.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.101-109,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
17.

Conference Proceedings
Conference Proceedings
17. High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate
Rahman, M.D. ; Alemy, E. ; Conley, W. ; Miller, D. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.127-135,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
18.

Conference Proceedings
Conference Proceedings
18. Negative photoresist for 157-nm microlithography: a progress report
Conley, W. ; Trinque, B.C. ; Miller, D.A. ; Zimmerman, P. ; Kudo, T. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.94-100,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
19.

Conference Proceedings
Conference Proceedings
19. Evaluation of zernike sensitivity method for CD distribution
Nakashima, T. ; Slonaker, S.D. ; Kudo, T. ; Hirukawa, S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1600-1610,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
20.

Conference Proceedings
Conference Proceedings
20. Simulation benchmarking
Tyminski, J.K. ; Nakashima, T. ; Kudo, T. ; Slonaker, S.D. ; Hirukawa, S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1544-1555,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
21.

Conference Proceedings
Conference Proceedings
21. Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists
Kudo, T. ; Alemy, E.L. ; Dammel, R.R. ; Kim, W.-K. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Rahman, M.D. ; Romano, A.R. ; Padmanaban, M. ; Chun, J.-S. ; Jung, J.-C. ; Lee, S.-K. ; Shin, K.-S. ; Kim, H.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.150-159,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
22.

Conference Proceedings
Conference Proceedings
22. PEB sensitivity studies of ArF resists: II. Polymer and solvent effects
Hong, C.-S. ; Lee, S.-H. ; Kim, W.-K. ; Kudo, T. ; Timko, A. ; Mckenzie, D. ; Anyadiegwu, C. ; Rahman, D.M. ; Lin, G. ; Dammel, R.R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1131-1137,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
23.

Conference Proceedings
Conference Proceedings
23. Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography
Hong, S. ; Takano, Y. ; Kanda, T. ; Kudo, T. ; Padmanaban, M. ; Tanaka, H. ; Lee, S.-H. ; Lee, J.-H. ; Woo, S.-G.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.195-206,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
24.

Conference Proceedings
Conference Proceedings
24. PEB sensitivity studies of ArF resist
Lee, S.H. ; Kim, W.-K. ; Rahman, D.M. ; Kudo, T. ; Timko, A. ; Anyadiegwu, C. ; McKenzie, D.S. ; Kanda, T. ; Dammel, R.R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.798-806,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
25.

Conference Proceedings
Conference Proceedings
25. Performance of imide and methide onium PAGs in 193-nm resist formulations
Padmanaban, M. ; Dammel, R.R. ; Lee, S.H. ; Kim, W.-K. ; Kudo, T. ; McKenzie, D.S. ; Rahman, D.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.743-751,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039