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Conference Proceedings

1. Growth of Group III Nitrides on Various Plane Substrates

Amano, H. ; Honshio, A. ; Kitano, T. ; Miyake, Y. ; lida, K. ; Kawashima, T. ; Imura, M. ; Balakrishnan, K. ; Iwaya, M. ; Kamiyama, S. ; Akasaki, I.

Pub. info.:	State-of-the-art program on compound semiconductors XLI and nitride and wide bandgap semiconductors for sensors, photonics, and electronics V : proceedings of the international symposia. pp.192-199, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-06

Conference Proceedings

2. Evaluation of resist-film property for CD control

Shinya, H. ; Kitano, T. ; Matsui, H. ; Kitano, J.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.690-702, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

3. Model of coating and drying process for flat polymer film fabrication

Kagami, H. ; Miyagawa, R. ; Kawata, A. ; Nakashima, D ; Kobayashi, S. ; Kitano, T. ; Takeshita, K. ; Kubota, H. ; Ohmi, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.252-259, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

4. Evaluation of resist-film property by scan- and spin-coating

Shinya, H. ; Ishii, T. ; Wakamoto, Y. ; Sugimoto, S. ; Kitano, T.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.939-950, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376