1.

Conference Proceedings
Conference Proceedings
1. Linewidth measurement of wafers using SEM and its uncertainty evaluation
Ko,Y.-U. ; Eom,T.-B. ; Kim,K.-H. ; Kim,S.-W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.159-168,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
2.

Conference Proceedings
Conference Proceedings
2. Characterization and optimization of CD control for 0.25-ｦﾌm CMOS applications
Ronse,K. ; Beeck,M.Opde ; Yen,A. ; Kim,K.-H. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part2  pp.555-563,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726