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Conference Proceedings

1. Fabrication and Characteristics of High Speed Implant-Confined, Index-Guided, Lateral-current, 850 nm Vertical Cavity Surface Emitting Lasers*

Park, K.-Y. ; Chol, H.-H. ; Kim, H.-K. ; Kim, J.-S. ; Kwon, S.-Y. ; Choi, S.-Y.

Pub. info.:	State-of-the-art program on compound semiconductors XXXVI and wide bandgap semiconductors for photonic and electronic devices and sensors II : proceedings of the international symposia. pp.213-224, 2002. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-3

Conference Proceedings

2. SWIR diodes of HgCdTe on GaAs substrates grown by metal organic vapor phase epitaxy

Kim, J.-S. ; An, S.-Y. ; Suh, S.-H.

Pub. info.:	Materials for infrared detectors II : 8-9 July 2002 ,Seattle, Washington, USA. pp.207-212, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4795

Conference Proceedings

3. Characteristics of HgCdTe layers grown by MOVPE on (211)B CdTe/Si substrates

Suh, S.-H. ; Kim, J.-S. ; Seo, D.-W. ; Hahn, S.-R. ; Sivananthan, S.

Pub. info.:	Materials for infrared detectors II : 8-9 July 2002 ,Seattle, Washington, USA. pp.1-7, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4795

Conference Proceedings

4. Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.

Hwang, Y.-S. ; Jung, J.-C. ; Park, K.-D. ; Lee, S.-K. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S. ; Ding, S.-J. ; Xiang, Z. ; Neisser, M.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.1119-1125, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

5. Contact hole resolution enhancement by post exposure amine treatment (CONPEAT) process

Koh, C.-W. ; Kim, J.-S. ; Choi, C.-I. ; Eom, T.-S. ; Kwon, W.-T. ; Jung, J.-C. ; Bok, C.-K. ; Shin, K.-S.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.793-798, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

6. Contact hole patterning performance of ArF resist for 0.10μm technology node

Kim, J.-S. ; Jung, J.-C. ; Kong, K.-K. ; Lee, G.-S. ; Lee, S.-K. ; Hwang, Y.-S. ; Shin, K.-S.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.577-585, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

7. 100-nm device fabrication using ArF resist

Lee, S.-K. ; Jung, J.-C. ; Hwang, Y.-S. ; Park, K.-D. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.571-576, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

8. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

Choi, S.-J. ; Cha, H.-S. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, D.-H. ; Kim, J.-M. ; Kim, J.-S. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.303-311, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

9. Improved characteristics of rainbow defects with novel wafer edge exposure technique

Shim, K.-C. ; Kim, M.-S. ; Lee, E.-S. ; Lee, C.-S. ; Gil, M.-G. ; Kim, B.-H. ; In, J.-S. ; Yoon, T.-B. ; Kim, J.-S.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part Two pp.919-926, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

10.

Conference Proceedings

10. Game transport protocol: a reliable lightweight transport protocol for massively multiplayer online games (MMPOGs)

Pack, S.H. ; Hong, E.S. ; Choi, Y.H. ; Park, I..K. ; Kim, J.-S. ; Ko, D.

Pub. info.:	Multimedia Systems and Applications V. pp.83-94, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4861

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