1.

Conference Proceedings
Conference Proceedings
1. Evolution of a 193-nm bilayer resist for manufacturing
Kwong, R.W. ; Khojasteh, M. ; Lawson, P. ; Hughes, T. ; Varanasi, P.R. ; Brunsvold, B. ; Allen, R.D. ; Brock, P.J. ; Sooriyakumaran, R. ; Truong, H.D. ; Mahorowala, A.P. ; Medeiros, D.R.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.403-409,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities
Khojasteh, M. ; Chen, K.R. ; Kwong, R.W. ; Lawson, M.C. ; Varanasi, P.R. ; Patel, K.S. ; Kobayashi, E.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.187-194,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039