Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 results

Conference Proceedings

1. Method of expanding process window for the double exposure technique with alt-PSMs

Kikuchi,K. ; Ohnuma,H. ; Kawahira,H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.121-131, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Effective data compaction algorithm for vector scan EB writing system

Ueki,S. ; Ashida,I. ; Kawahira,H.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.589-600, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

3. Development of fast linewidth correction system

Takenouchi,R. ; Ashida,I. ; Kawahira,H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.688-696, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

4. Magneic neutral loop discharge etching for 130-nm generation photomask fabrication

Katsumata,M. ; Kawahira,H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.210-217, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

5. High-performance devices in the new century: optical lithography and mask strategy for 0.13-μm SoC (Photomask Japan 2000 panel discussion review)

Kawahira,H. ; Nagano,V.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.384-394, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

6. New mask data verification method after optical proximity effect correction

Ogawa,K. ; Ashida,I. ; Kawahira,H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.186-193, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

7. Focused ion beam repair for quartz bump defect of alternating phase-shift masks

Kagami,I. ; Kakuta,D. ; Komizo,T. ; Kawahira,H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.563-573, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

8. Optimization of fabrication process for dual-trench-type alternating PSM

Komizo,T. ; Kagami,I. ; Kakuta,D. ; Kawahira,H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.125-131, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

9. New optimization method of exposure with alternative phase-shifting masks

Kikuchi,K. ; Ohnuma,H. ; Kawahira,H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.41-51, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

10.

Conference Proceedings

10. New method for reducing across chip poly-CD variation with statistical OPC/gauge capability analysis

Ohnuma,H. ; Kikuchi,K. ; Kawahira,H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.362-367, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Select: Check all | Remove all

Sort order

10 results

Filtering by: