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14 results

Conference Proceedings

1. Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser Lithography

Kagami,I. ; Ishikawa,K. ; Kakuta,D. ; Kawahira,H.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.953-963, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

2. PMJ '99 panel discussion review:OPC mask technology for KrF Lithography

Kawahira,H. ; Hayashi,N. ; Hamada,H.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.318-327, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

3. Photomask fabrication feasibility for next-generation reticle format

Katsumata,M. ; Kawahira,H. ; Nozawa,S.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.198-205, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

4. Fast chip-level OPC system on mask database

Ohnuma,H. ; Tsudaka,K. ; Kawahira,H.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.145-153, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

5. Fast EB-PEC system for 0.25-ｦﾌm device reticle fabrication using a variable shaped beam machine

Tomita,M. ; Ohnuma,H. ; Koyama,M. ; Kawahira,H.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.546-557, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

Conference Proceedings

6. Attenuated phase-shifting mask specification with modified beam illumination

Kagami,I. ; Sugawara,M. ; Kawahira,H. ; Tsudaka,K. ; Ishikawa,K. ; Nozawa,S.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.445-456, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

Conference Proceedings

7. Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity

Sugawara,M. ; Ishikawa,K. ; Kawahira,H. ; Kagami,I. ; Nozawa,S.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.457-472, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

Conference Proceedings

8. Chemically amplified resist process for 0.25-ｦﾌm-generation photomasks

Katsumata,M. ; Kawahira,H. ; Sugawara,M. ; Nozawa,S.

Pub. info.:	16th Annual BACUS Symposium on Photomask Technology and Management. pp.83-91, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2884

Conference Proceedings

9. Influence of process latitude on exposure characteristics

Sugawara,M. ; Kawahira,H. ; Nozawa,S.

Pub. info.:	Optical Microlithography IX. Part2 pp.583-597, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

10.

Conference Proceedings

10. Automatic alternative phase-shift mask CAD layout tool for gate shrinkage of ebedded DRAM in logic below 0.18 ｦﾌm

Ohnuma,H. ; Kawahira,H.

Pub. info.:	Photomask and X-Ray Mask Technology V. pp.206-213, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3412

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