1.

Conference Proceedings
Conference Proceedings
1. Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes
Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.170-179,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Design and performance of photoresist materials for ArF lithography
Kim,H.-W. ; Jung,D.-W. ; Lee,S. ; Choi,S.-J. ; Woo,S.-G. ; Kavanagh,R.J. ; Barclay,G.G. ; Blacksmith,R.F. ; Kang,D. ; Pohlers,G. ; Cameron,J.F. ; Mattia,J. ; Caporale,S. ; Penniman,T. ; Joesten,L.A. ; Thackeray,J.W.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.776-783,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
3.

Conference Proceedings
Conference Proceedings
3. Simulation of 193-nm photoresists based on different polymer platforms
Kang,D. ; Robertson,S.A. ; Pavelchek,E.K.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.936-944,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
4.

Conference Proceedings
Conference Proceedings
4. Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes
Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.
Pub. info.: Optical Microlithography XIV.  4346  pp.858-868,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
5.

Conference Proceedings
Conference Proceedings
5. Verification of the effect of mask on the mask error enhancement factor of contact holes
Reilly,M.T. ; Robertson,S.A. ; Parker,C.R. ; Kang,D. ; Dusa,M.V. ; MacDonald,S.S. ; West,C.A.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.948-953,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
6.

Conference Proceedings
Conference Proceedings
6. Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone
Tanaka,T. ; Choi,S.-J. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Kang,Y. ; Woo,S.-G. ; Moon,J.-T. ; Kavanagh,R.J. ; Barclay,G.G. ; Orsula,G.W. ; Mattia,J. ; Caporale,S. ; Adams,T.G. ; Tanaka,T. ; Kang,D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.119-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345