1.

Conference Proceedings
Conference Proceedings
1. Materials for an attenuated phase-shifting mask in 157-nm lithography
Matsuo,T. ; Onodera,T. ; Itani,T. ; Morimoto,H. ; Haraguchi,T. ; Kanayama,K. ; Otaki,M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.268-274,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
2.

Conference Proceedings
Conference Proceedings
2. Realization of mass prouction for 130-nm node and future application for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography
Ii,T. ; Saga,T. ; Hattori,Y. ; Ohshima,T. ; Otaki,M. ; Iwakata,M. ; Haraguchi,T. ; Kanayama,K. ; Yamazaki,T. ; Fukuhara,N. ; Matsuo,T.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.297-308,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. ZrSiON as a material for high-transmittance attenuated PSM
Kanayama,K. ; Haraguchi,T. ; Yamazaki,T. ; Ii,T. ; Matsuo,T. ; Fukuhara,N. ; Saga,T. ; Hattori,Y. ; Ooshima,T. ; Otaki,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.147-154,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409