1.

Conference Proceedings
Conference Proceedings
1. SILICON SURFACES EXPOSED TO ANHYDROUS HF/CH3OH ETCHING
Torek, K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.384-391,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
2.

Conference Proceedings
Conference Proceedings
2. REMOVAL OF Al FROM SILICON SURFACES USING UV/Cl2
Daffron, C. ; Torek, K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.281-287,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
3.

Conference Proceedings
Conference Proceedings
3. CLEANING OF SILICON SURFACE AFTER RIE USING UV/OZONE AND HF/CH3OH
Hwang, D.K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.401-408,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7