1.

Conference Proceedings
Conference Proceedings
1. Optimization of measuring conditions for templates of UV nano imprint lithography
K. Yoshida ; K. Kojima ; M. Abe ; S. Sasaki ; M. Kurihara
Pub. info.: Photomask and next-generation lithography mask technology XV.  2  pp.70281V-1-70281V-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
2.

Conference Proceedings
Conference Proceedings
2. Development status of back-end process for UV-NIL template fabrication
Y. Inazuki ; K. Itoh ; S. Hatakeyama ; K. Kojima ; M. Kurihara
Pub. info.: Photomask technology 2008.  2  pp.71223Q-1-71223Q-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
3.

Conference Proceedings
Conference Proceedings
3. Metrology for templates of UV nano imprint lithography
K. Yoshida ; K. Kojima ; M. Abe ; S. Sasaki ; M. Kurihara
Pub. info.: Photomask technology 2007.  3  pp.67305O-1-67305O-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730