1.

Conference Proceedings
Conference Proceedings
1. PROPERTIES OF CHEMICAL OXIDES FROM PRE-GATE CLEAN PROCESSES AND THEIR ROLE IN THE ELECTRICAL THICKNESS OF THERMALLY GROWN ULTRATHIN GATE OXIDES
Guan, J. ; Gale, G. ; Bersuker, G. ; Jeon, Y. ; Nguyen, B. ; Barnett, J. ; Jackson, M. ; Burkman, D. ; Peavey, P. ; Yokomizo, K. ; Ueno, K. ; Yamasaka, M. ; Imai, M. ; Kitahara, S. ; Shindo, N.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.77-83,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
2.

Conference Proceedings
Conference Proceedings
2. Nitrogen (N2) Implantation to Suppress Growth of Interfacial Oxide in MOCVD BST and Sputtered BST Films
Nieh, R. ; Qi, W-J. ; Jeon, Y. ; Lee, B. H. ; Lucas, A. ; Kang, L. ; Lee, J. C. ; Gardner, M. ; Gilmer, M.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.521-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567