Kariya, M. ; Yamanaka, E. ; Tanaka, S. ; Ikeda, T. ; Yamaguchi, S. ; Itoh, M. ; Kobayashi, H. ; Kawashima, T. ; Narukawa, S.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.550-555, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering