1.

Conference Proceedings
Conference Proceedings
1. Probing the environmental stability and bake latitudes of acetal vs.ketal protected polyvinylphenol DUV resist systems
Kumar,U. ; Pandya,A. ; Sinta,R.F. ; Huang,W.-S. ; Bantu,R. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.135-145,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
2.

Conference Proceedings
Conference Proceedings
2. Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
Huang,W.-S. ; Sooriyakumaran,R. ; Kwong,R.W. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.776-785,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Negative-tone resist system using vinyl cyclic acetal crosslinker
Huang,W.-S. ; Lee,K.Y. ; Chen,R.K.-J. ; Schepis,D.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.315-322,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
4.

Conference Proceedings
Conference Proceedings
4. Ultralow-stress silicon-rich nitride films for microstructure fabrication
Cheng,M.-C. ; Ho,W.-G. ; Chang,C.-P. ; Huang,W.-S. ; Huang,R.-S.
Pub. info.: Device and process technologies for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia.  pp.152-157,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3892
5.

Conference Proceedings
Conference Proceedings
5. Method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist:KRS
Petrillo,K. ; Brancaccio,J. ; Huang,W.-S. ; Kwong,R.W. ; Katnani,A.D.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.319-328,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
6.

Conference Proceedings
Conference Proceedings
6. High-contrast positive resists for e-beam mask making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Angelopoulos,M. ; Bucchiagnano,J. ; Petrillo,K.E. ; Ito,H.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.400-408,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546