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23 results

Conference Proceedings

1. Development of the ASML EUV alpha demo tool

Romeo, C. ; Cantu, P. ; Henry, D. ; Takekoshi, H. ; Hirayanagi, N. ; Suzuki, K. ; McCallum, M. ; Fujita, H. ; Takikawa, T. ; Hoga, M.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.90-101, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

2. R-mask: a new concept and its application for small-volume production

Hayano, K. ; Hotta, S. ; Hasegawa, N. ; Hosono, K. ; Tanaka, T. ; Suko, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.257-268, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

3. Unified mask data formats for EB writers

Kuriyama, K. ; Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.660-671, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

4. Development of LEEPL 6025 format mask blanks

Aritsuka, Y. ; Iimura, Y. ; Hoga, M. ; Sano, H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.951-957, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

5. Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography

Morikawa, Y. ; Kokubo, H. ; Noguchi, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Kanda, N. ; Irie, S. ; Watanabe, K. ; Suganaga, T. ; Itani, T.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1137-1145, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

6. Evaluation of a transmission CD-SEM for EB stencil masks

Ishikawa, M. ; Fujita, H. ; Hoga, M. ; Sano, H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.898-906, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Shot number analysis at 65-nm node mask writing using VSB writer

Hirumi, J. ; Kuriyama, K. ; Yoshioka, N. ; Yoshikawa, R. ; Hojo, Y. ; Matuzaka, T. ; Tanaka, K. ; Hoga, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.309-317, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. CD-measurement technique for hole patterns on stencil mask

Ishikawa, M. ; Yusa, S. ; Takikawa, T. ; Fujita, H. ; Sano, H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1107-1116, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

9. Feasibility study of manufacturing process and quality control for the new alternatingPSM structure (BACUS Best Poster)

Morikawa, Y. ; Kokubo, H. ; Nishiguchi, M. ; Nara, M. ; Totsu, Y. ; Hoga, M. ; Hayashi, N.

Pub. info.:	18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.224-234, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4764

10.

Conference Proceedings

10. Image placement accuracy of single-membrane stencil masks for e-beam lithography [5992-162]

Kitada, M. ; Yusa, S. ; Kuwahara, N. ; Fujita, H. ; Takikawa, T. ; Sano, H. ; Hoga, M.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59924R-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

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