Sugisaki, K. ; Okada, M. ; Zhu, Y. ; Otaki, K. ; Liu, Z. ; Kawakami, J. ; Ishii, M. ; Saito, J. ; Murakami, K. ; Hasegawa, M. ; Ouchi, C. ; Kato, S. ; Hasegawa, T. ; Suzuki, K. ; Yokota, H. ; Niibe, M. ; Takeda, M.
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Advances in metrology for x-ray and EUV optics : 2-3 August 2005, San Diego, California, USA. pp.59210D-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Hasegawa, M. ; Watanabe, H. ; Yamada, T. ; Kato, S.
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Visual communications and image processing 2002 : 21-23 January 2002, San Jose, USA. pp.915-922, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Hasegawa, M. ; Ouchi, C. ; Hasegawa, T. ; Kato, S. ; Ohkubo, A. ; Suzuki, A. ; Sugisaki, K. ; Okada, M. ; Otaki, K. ; Murakami, K. ; Saito, J. ; Niibe, M. ; Takeda, M.
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Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II : 5 August 2004, Denver, Colorado, USA. pp.27-36, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Wavelet and Independent Component Analysis Applications IX. pp.115-124, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ouchi, C. ; Kato, S. ; Hasegawa, M. ; Hasegawa, T. ; Yokota, H. ; Sugisaki, K. ; Okada, M. ; Murakami, K. ; Saito, J. ; Nilbe, M. ; Takeda, M.
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Metrology, Inspection, and Process Control for Microlithography XX. pp.61522O-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering