1.

Conference Proceedings
Conference Proceedings
1. Resist blur and line edge roughness (Invited Paper)
Zhang, G. ; Terry, M. ; O'Brien, S. ; Soper, R. ; Mason, M. ; Kim, W. ; Wang, C. ; Hansen, S. ; Lee, J. ; Ganeshan, J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.38-52,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Precipitation Strengthening in a Low Carbon Nb-Microalloyed Steel
Bai, D.Q. ; Hamad, F. ; Asante, J. ; Hansen, S.
Pub. info.: Microalloying for new steel processes and applications : proceedings of the International Conference on Microalloying for New Steel Processes and Applications 7th-9th September 2005, Donostia-San Bebastián, Basque Country, Spain.  pp.481-488,  2005.  Zurich.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 500-501
3.

Conference Proceedings
Conference Proceedings
3. Mechanisms of Low-Temperature Wafer Bending
Reiche, M. ; Radu, I. ; Gabriel, M. ; Zoberbier, M. ; Hansen, S. ; Eichler, M.
Pub. info.: Semiconductor wafer bonding : science, technology, and applications : proceedings of the international symposia.  pp.326-337,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-02
4.

Conference Proceedings
Conference Proceedings
4. Capabilities of an Ambient Pressure Plasma for Activation in LT Wafer Bonding Processes
Gabriel, M. ; Cetin, V. ; Hansen, S. ; Reiche, M. ; Radu, I. ; Eichler, M.
Pub. info.: Semiconductor wafer bonding : science, technology, and applications : proceedings of the international symposia.  pp.50-57,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-02
5.

Conference Proceedings
Conference Proceedings
5. Precision process calibration and CD predictions for low-k1 lithography [5853-64]
Chen, T. ; Park, S. ; Berger, G. ; Coskun, T. H. ; de Vocht, J. ; Chen, F. ; Yu, L. ; Hsu, S. ; van den Broeke, D. ; Socha, R. ; Park, J. ; Gronlund, K. ; Davis, T. ; Plachecki, V. ; Harris, T. ; Hansen, S. ; Lambson, C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.785-799,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. Enabling the 45nm node by hyper-NA polarized lithography [6154-11]
De Boeij, W. ; Swinkels, G ; Le Masson, N. ; Koolen, A. ; Van Greevembroek, H. ; Klaassen, M. ; Van de Kerkhof, M. ; Van Ingen Schenau, K. ; De Winter, L. ; Wehrens, M. ; Hansen, S. ; Wagner, C.
Pub. info.: Optical Microlithography XIX.  pp.61540B-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
7.

Conference Proceedings
Conference Proceedings
7. The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging [5992-37]
Geh, B. ; Flagello, D. G. ; Pregler, C. ; Martin, P. M. ; Leunissen, L. H. A. ; Hansen, S. ; de Boeij, W.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599210-599210,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
8.

Conference Proceedings
Conference Proceedings
8. Predictive modeling of advanced illumination pupils used as imaging enhancement for low-k1 applications
Heil, T. ; Graupner, P. ; Garreis, R. ; Egger, R. ; Brotsack, M. ; Finders, J. ; Hansen, S.
Pub. info.: Optical Microlithography XVII.  pp.344-356,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
9.

Conference Proceedings
Conference Proceedings
9. Illumination source mapping and optimization with resist-based process metrics for low-k1 imaging
Zhang, G. ; Hansen, S.
Pub. info.: Optical Microlithography XVII.  pp.369-380,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
10.

Conference Proceedings
Conference Proceedings
10. Characterization of ACLV for advanced technology nodes using scatterometer-based lens fingerprinting technique
Wang, C.A. ; Zhang, G. ; DeMoor, S. ; Tan, C. ; Ilzhoefer, J. ; Atkinson, C. ; Wickman, C. ; Hansen, S. ; Geh, B. ; Flagello, D.G. ; Boehm, M.
Pub. info.: Optical Microlithography XVII.  pp.581-590,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377