1.

Conference Proceedings
Conference Proceedings
1. BIORESIST: a lithographic approach for the patterning of cells in tissue engineering applications
He, W. ; Gonsalves, K.E. ; Halberstadt, C.R. ; Umar, Y. ; Choi, J.-H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.502-507,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. High-sensitivity nanocomposite resist materials for x-ray and EUV lithography
Ali, M.A. ; Gonsalves, K.E. ; Batina, N. ; Golovkina, V. ; Cerrina, F.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1173-1180,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
3.

Conference Proceedings
Conference Proceedings
3. Nanocomposite resist for low-voltage electron beam lithography (LVEBL)
Ali, M.A. ; Gonsalves, K.E. ; Agrawal, A. ; Jeyakumar, A. ; Henderson, C.L.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.442-452,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039