1.

Conference Proceedings
Conference Proceedings
1. Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon
Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; Stalk, P.A. ; Huizing, H.G.A. ; van Berkum, J.G.M ; Toan, N.N. ; Woerlee, P.H. ; Cristiano, F. ; Claverie, A.
Pub. info.: Advances in rapid thermal processing : proceedings of the symposium.  pp.125-132,  1999.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-10
2.

Conference Proceedings
Conference Proceedings
2. Interdiffusion Mechanisms in Coherently Strained SiGe Multilayers
Cowern, N.E.B. ; Kersten, W.J. ; Kruif, R.C.M. ; van Berkum, J.G.M. ; de Boer, W.B. ; Gravesteijn, D.J. ; Bulle-Liewma, C.W.T.
Pub. info.: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.195-209,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-4
3.

Conference Proceedings
Conference Proceedings
3. ANOMALOUS TRANSIENT TAIL DIFFUSION OF BORON IN SILICON: KINETIC MODELING OF DIFFUSION AND CLUSTER FORMATION
Cowern, N.E.B. ; Jos, H.F.F. ; Janssen, K.T.F ; Wachters, A.J.H.
Pub. info.: Impurities, defects, and diffusion in semiconductors : bulk and layered structures : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A..  pp.605-608,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 163
4.

Conference Proceedings
Conference Proceedings
4. TRANSIENT DIFFUSION OF SOPANTS IN SILICON: PHYSICS MODELING, AND PRACTICAL SIMULATIONS
Cowern, N.E.B.
Pub. info.: Proceedings of the Third International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.20-33,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-6