1.

Conference Proceedings
Conference Proceedings
1. Design and synthesis of new photoresist materials for ArF lithography
Choi,S.-J. ; Kim,H.-W. ; Woo,S.-G. ; Moon,J.-T.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.54-61,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Novel polymers for 193-nm single-layer resist based on cycloolefin polymers
Kim,H.-W. ; Lee,S.-H. ; Kwon,K.-Y. ; Jung,D.-W. ; Lee,S. ; Yoon,K.-S. ; Choi,S.-J. ; Woo,S.-G. ; Moon,J.-T.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1100-1107,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. Novel resst material for sub-100-nm contact hole pattern
Chung,J.-H. ; Choi,S.-J. ; Kang,Y. ; Woo,S.-G. ; Moon,J.-T.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.305-312,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999