1.

Conference Proceedings
Conference Proceedings
1. Challenge to 0.13-ｦﾌm device patterning using KrF
Kim,I.-S. ; Lee,J.-H. ; Cha,D.-H. ; Park,J.-S. ; Cho,H.-K. ; Moon,J.-T.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.872-881,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of phase-edge phase-shifting mask for sub-0.18-ｦﾌm gate patterns in logic devices
Cha,D.-H. ; Kye,J.-W. ; Seong,N.-G. ; Kang,H.-Y. ; Cho,H.-K. ; Moon,J.-T.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.46-54,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
3.

Conference Proceedings
Conference Proceedings
3. Measurement of pitch dependency of overlay errors under OAI by using an electric CD measurement technique
Seong,N. ; Kim,H. ; Cho,H.-K. ; Moon,I.-T. ; Lee,S.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1170-1174,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Detectability and printability of programmed defect reticle for 256-Mb dram
Park,J.H. ; Cho,H.-K. ; Kim,Y.-H. ; Lee,K.-H. ; Yoon,H.-S.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.300-311,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
5.

Conference Proceedings
Conference Proceedings
5. Current status of mask CD uniformity as related to e-beam system
Lim,S.-C. ; Kim,B.-G. ; Choi,S.-W. ; Lee,K.-H. ; Cho,H.-J. ; Yu,Y.-H. ; Cho,H.-K. ; Sohn,J.-M.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.301-311,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236