Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

17 results

Conference Proceedings

1. Advanced module-based approach to effective CD prediction of sub-100nm patterns

Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA. pp.65-73, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5378

Conference Proceedings

2. Assessments on process parameters' influences to the proximity correction

Lee, E.-M. ; Lee, S.-W. ; Lee, D.-Y. ; Choi, S.-H. ; Park, J.-O. ; Jung, S.-G. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.287-295, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

3. Way for LEEPL technology to succeed in memory device application

Kim, I.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.1060-1067, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

4. Successful application of angular scatterometry to process control in sub-100-nm DRAM device

Kim, J.- ; Kim, S.-J. ; Chin, S.-B. ; Oh, S.-H. ; Goo, D.-H. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T. ; Raymond, C.J. ; Littau, M.E. ; Youn, B.J. ; Sohn, C.-J.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.541-549, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

5. Image simulation in immersion lithography using Debye integral and scattering matrix method

Kim, S.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.393-404, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

6. Evaluation of puddle time effect and optimization of development process in 193-nm lithography

Lee, H.-R. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1115-1122, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

7. Realization of sub-80-nm small-space patterning in ArF photolithography

Kim, S.-H. ; Kim, H.-D. ; Lee, S.-H. ; Park, C.-M. ; Ryoo, M.-H. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1082-1090, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

8. Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication

Jung, M.-H. ; Kim, H.-W. ; Hong, J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1100-1106, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

9. Layer-specific illumination for low-k1 periodic and semiperiodic DRAM cell patterns: design procedure and application

Hwang, C. ; Nam, D.-S. ; Park, J.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.947-952, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

10.

Conference Proceedings

10. Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Kim, H. ; Nam, D. ; Yeo, G.-S. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.459-462, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

17 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by: