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12 results

Conference Proceedings

1. Layer-specific illumination optimization by Monte Carlo method

Kim, H.-C. ; Nam, D.-S. ; Hwang, C. ; Kang, Y.S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.244-250, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

2. Evaluation of ArF CLM in the sub-100-nm DRAM cell

Lee, J.-H. ; Chung, D.-H. ; Kim, H.-C. ; Nam, D.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.251-260, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

3. Flare-induced CD variation correction using transmittance controlled mask

Nam, D.-S. ; Yeo, G.-S. ; Park, J.R. ; Choi, S.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.561-569, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. ArF issues of 90-nm-node DRAM device integration

Goo, D.-H. ; Kim, B.-S. ; Park, J.-S. ; Yoon, K.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XVI. Part Three pp.1296-1303, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

5. Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Kang, H.-J. ; Lee, S.-W. ; Lee, D.-Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1194-1201, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

6. Process latitude extension in low k1 DRAM lithography using specific layer-oriented illumination design

Kang, Y.S. ; Nam, D.-S. ; Hwang, C. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part Three pp.1304-1309, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

7. Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device

Lee, J.-H. ; Kim, H.-D. ; Chung, D.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.727-735, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. Improvement of pattern collapse in sub-100 nm nodes

Jung, M.-H. ; Lee, S.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XX. 2 pp.1298-1303, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

Conference Proceedings

9. Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography

Kim, S.-H. ; Lee, S.-H. ; Yeo, G.-S. ; Lee, J.H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Advances in Resist Technology and Processing XX. 2 pp.940-947, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

10.

Conference Proceedings

10. What an antishrinkage coating method can surmount among stumbling block of ArF resists

Kim, H.-D. ; Lee, S.-H. ; Choi, S.-J. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Advances in Resist Technology and Processing XX. 2 pp.827-837, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

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