1.

Conference Proceedings
Conference Proceedings
1. Constant current-stress-induced breakdown of reoxidized nitrided oxide (ONO) in flash memory devices
Cha,C.L. ; Chor,E.F. ; Gong,H. ; Zhang,A.Q. ; Chan,L.H. ; Xie,J.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.368-375,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
2.

Conference Proceedings
Conference Proceedings
2. Characterization of polymer formation during Si02 etching with different fluorocarbon gases (CHF3,CF4,C4F8)
Loong,S.Y. ; Lee,H.K. ; Chan,L.H. ; Zhou,M.S. ; Loh,F.C. ; Tan,K.L.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.376-382,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
3.

Conference Proceedings
Conference Proceedings
3. Elimination of bottom-pinching effect in environmentally stable chemically amplified resists
Soo,C.P. ; Fan,M.H. ; Bourdillon,A.J. ; Chan,L.H.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.727-734,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
4.

Conference Proceedings
Conference Proceedings
4. Impact of nitrogen ion implantation on deep submicron SALICIDE process
Lim,C.W, ; Lahiri,S.K. ; Tung,C.H. ; Wong,S.M. ; Lee,K.H. ; Wong,H. ; Pey,K.L. ; Chan,L.H.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.151-161,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
5.

Conference Proceedings
Conference Proceedings
5. Effect of argon or nitrogen preamorphized implant on SALICIDE formation for deep submicron CMOS technology
Ho,C.S. ; Pey,K.L. ; Wong,H. ; Karunasiri,R.P.G. ; Chua,S.J. ; Lee,K.H. ; Tang,Y. ; Wong,S.M. ; Chan,L.H.
Pub. info.: Microlithographic Techniques in IC Fabrication.  pp.243-254,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3183
6.

Conference Proceedings
Conference Proceedings
6. Characterization of pattern density and the metal stack composition on chlorine residues from the metal etch process
Loong,S.Y. ; Lee,H.K. ; Zhou,M.S. ; Chan,L.H. ; Premachandran,V.
Pub. info.: Multilevel Interconnect Technology II.  pp.170-180,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3508
7.

Conference Proceedings
Conference Proceedings
7. Effect of different barrier materials on antifuse performance
Ang,T.C. ; Tse,M.S. ; Chan,L.H. ; Sudijono,J.L.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis IV.  pp.233-239,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3510