1.

Conference Proceedings
Conference Proceedings
1. Optimal sampling strategies for sub-100-nm overlay
Rangarajan,B. ; Templeton,M.K. ; Capodieci,L. ; Subramanian,R. ; Scranton,A.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.348-359,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. CD uniformity consideration for DUV step and scan tools
Seltmann,R. ; Minvielle,A.M. ; Spence,C.A. ; Muehle,S. ; Capodieci,L. ; Nguyen,K.B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.239-249,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Extending the limits of i-line lithography for via layers and minimization of dense-iso bias
Subramanian,R. ; Spence,C.A. ; Capodieci,L. ; Werner,T. ; Gallardo,E.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.914-922,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Photoresist development modeling based on continuity equations
Zhu,Y. ; Capodieci,L. ; Cerrina,F.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.201-211,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
5.

Conference Proceedings
Conference Proceedings
5. Impact of coma on CD control for multiphase PSM designs
Schmidt,R.T. ; Spence,C.A. ; Capodieci,L. ; Krivokapic,Z. ; Geh,B. ; Flagello,D.G.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.15-24,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334