Aparicio, R. ; Birkmire, R. ; Pant, A. ; Huff, M. ; Russell, T.W.F.
Pub. info.:
Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium. pp.260-267, 2001. Pennington, N.J.. Electrochemical Society