Sebmolke, R. ; Blietz, M. ; Hoelzl, R. ; Menzel, D. ; Bender, H.
Pub. info.:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.658-669, 2002. Pennington, NJ. Electrochemical Society
Vantomme, A. ; Wu, M. F. ; Hogg, S. ; Langouche, G. ; Jacobs, K. ; Moerman, I. ; White, M. E. ; O'Donnell, K. P. ; Nistor, L. ; Landuyt, J. Van ; Bender, H.
Pub. info.:
GaN and related alloys - 1999 : symposium held November 28-December 3, 1999, Boston, Massachusetts, U.S.A.. pp.W11.38.1-, 2000. Warrendale, Pa.. MRS-Materials Research Society
Brijs, B. ; Bender, H. ; Huyghebaert, C. ; Janssens, T. ; Vandervorst, W. ; Nakajima, K. ; Kimura, K. ; Bergmaier, A. ; Dollinger, G. ; van den Berg, J.A.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.50-62, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Kaushik, V. S. ; DeGendt, S. ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S. V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
Pub. info.:
Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.145-152, 2003. Warrendale, PA. Materials Research Society
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.357-372, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Boher, P. ; Defranoux, C. ; Bourtauld, S. ; Piel, J.P. ; Bender, H.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.305-315, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Bender, H. ; Conard, T. ; Richard, O. ; Brijs, B. ; Petry, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Wolstenholme, J. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J-J. ; Bergmaier, A. ; Dollinger, G.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.223-232, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Kaushik, V.S. ; Gendt, S.De ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S.V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
Pub. info.:
Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.335-342, 2003. Warrendale, Pa.. Materials Research Society
Boher, P. ; Defranoux, C. ; Bourtauld, S. ; Piel, J.P. ; Bender, H.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.305-315, 2003. Pennington, NJ. Electrochemical Society
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.357-372, 2003. Pennington, NJ. Electrochemical Society
Vandervorst, W. ; Brijs, B. ; Bender, H. ; Conard, O.T. ; Petry, J. ; Richard, O. ; Elshocht, S.Van ; Delabie, A. ; Caymax, M. ; Gendt, S.De
Pub. info.:
Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.23-34, 2003. Warrendale, Pa.. Materials Research Society
Zhao, C. ; Cosnier, V. ; Chen, P.J. ; Richard, O. ; Roebben, G. ; Maes, J. ; Elshocht, S.Van ; Bender, H. ; Young, E. ; Biest, O.Van Der ; Caymax, M. ; Vandervorst, W. ; Gendt, S.De ; Heyns, M.
Pub. info.:
Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.9-14, 2003. Warrendale, Pa.. Materials Research Society
Elshocht, S.Van ; Caymax, M. ; Gendt, S.De ; Conard, T. ; Petry, J. ; Claes, M. ; Witters, T. ; Zhao, C. ; Brijs, B. ; Richard, O. ; Bender, H. ; Vandervorst, W. ; Carter, R. ; Kluth, J. ; Date, L. ; Pique, D. ; Heyns, M.M.
Pub. info.:
Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.197-202, 2003. Warrendale, Pa.. Materials Research Society
Sun, L. ; Defranoux, C. ; Stehle, J. L. ; Boher, P. ; Evrard, P. ; Bellandi, E. ; Bender, H.
Pub. info.:
Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A.. pp.95-102, 2004. Warrendale, Pa.. Materials Research Society
Bender, H. ; Brijs, B. ; Peby, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Woistenholme, I. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J.-J. ; Bergmaier, A. ; Dollinger, G. ; Conard, T. ; Richard, O.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.223-232, 2003. Pennington, NJ. Electrochemical Society
Brijs, B. ; Bender, H. ; Huyghebaert, C. ; Janssens, T. ; Vandervorsi, W. ; Nakajima, K. ; Kimura, K. ; Bergmaier, A. ; Dollinger, G. ; van den Berg, J.A.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.50-62, 2003. Pennington, NJ. Electrochemical Society
Lanckmans, F. ; Brongersma, S. ; Varga, I. ; Bender, H. ; Beyne, E. ; Maex, K.
Pub. info.:
Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A.. pp.D1.4-, 2001. Warrendale, PA. Materials Research Society
Schmolke, R. ; Blietz, M. ; Hoelzl, R. ; Menzel, D. ; Bender, H.
Pub. info.:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.658-669, 2002. Pennington, NJ. Electrochemical Society
Caymax, Matty ; Bender, H. ; Brijs, B. ; Conard, T. ; Gendt, S. De ; Delabie, A. ; Heyns, M. ; Onsia, B. ; Ragnarsson, L. ; Richard, O. ; Vandervorst, W. ; Elshocht, S. Van ; Zhao, C. ; Maes, J. W. ; Date, L. ; Pique, D. ; Young, E. ; Tsai, W. ; Shimamoto, Y.
Pub. info.:
CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A.. pp.47-58, 2003. Warrendale, Pa.. Materials Research Society
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