1.

Conference Proceedings
Conference Proceedings
1. High Density Plasma Gate Etching of 0.12 um Devices with Sub-1.5 nm Gate Oxides
Klemens, F.P. ; Baumann, F.H. ; Kornblit, A. ; Layadi, N. ; Lee, H. ; Maynard, H.L. ; Mytych, J.M. ; Sorch, T.W. ; Tennant, D.M. ; Timp, G.L. ; Lee, J.T.C.
Pub. info.: Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes.  pp.85-95,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-30
2.

Conference Proceedings
Conference Proceedings
2. Selected Topics in Plasma Processing Research
Lee, J.T.C. ; Colonell, J.J. ; Klemens, F.P. ; Baumann, F.H. ; Kornblitt, A. ; Lee, H. ; Maynard, H.L. ; Sorsch, T.W. ; Timp, G.L. ; Layadi, N. ; Malyshev, M.V. ; Donnelly, V.M. ; Ciampa, N.A.
Pub. info.: Proceedings of the twelfth International Symposium on Plasma Processing.  pp.1-12,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-4
3.

Conference Proceedings
Conference Proceedings
3. NUMERICAL SIMULATIONS OF SPUTIER DEPOSITION AND ETCHING IN TRENCHES USING THE LEVEL SET TECHNIQUE
Suhlivan, P.O. ; Baumann, F.H. ; Gilzner, O.H.
Pub. info.: Proceedings of the Fifth International Symposium of Process Physics and Modeling in Semiconductor Technology.  pp.220-223,  1999.  Pennington, New Jersey.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-2