1.

Conference Proceedings
Conference Proceedings
1. Integrated add/drop multiplexer (ADM) using micromachined mirror
Li, J. ; Zhang, Q.X. ; Balasubramanian, N. ; Huang, J.M. ; Liu, A.Q.
Pub. info.: APOC 2001: Asia-Pacific Optical and Wireless Communications : optical switching and optical interconnection : 12-15 November 2001, Beijing, Chaina.  pp.87-94,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4582
2.

Conference Proceedings
Conference Proceedings
2. Gate Oxide Thinning in MOS Structures with Shallow Trench Isolation
Balasubramanian, N. ; Johnson, E. ; Perera, C. ; Mian, C.-S. ; Sheng, T.-T. ; Peidous, I.V. ; Ping, C. ; Cuthbertson, A. ; Sundaresan, R.
Pub. info.: The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000.  pp.125-130,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-2
3.

Conference Proceedings
Conference Proceedings
3. Threshold Stresses of Dislocation Generation Onset in Silicon
Peidous, I.V. ; Loiko, K.V. ; Balasubramanian, N. ; Schuelke, T.
Pub. info.: High Purity Silicon VI : proceedings of the sixth International Symposium.  pp.180-188,  2000.  Bellingham, Wash..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-17
4.

Conference Proceedings
Conference Proceedings
4. EFFECT OF WAFER BACKSIDE CLEAN PROCESS ON THE ULSI LITHOGRAPHY
Balasubramanian, N. ; Roy, M-M. ; Pauline, H.G. ; Dow, F. P.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.803-810,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
5.

Conference Proceedings
Conference Proceedings
5. EFFECT OF WAFER BACKSIDE CLEAN PROCESS ON THE ULSI LITHOGRAPHY
Balasubramanian, N. ; Roy, M-M. ; Dow, F.P. ; Pauline, H.G.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.803-812,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
6.

Conference Proceedings
Conference Proceedings
6. Patterning sub-50-nm Fin-FET using KrF lithography tool
Singh, N. ; Jagar, S. ; Mehta, S.S. ; Roy, M.M. ; Kumar, R. ; Balasubramanian, N.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.260-267,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
7.

Conference Proceedings
Conference Proceedings
7. Hybrid reconfigurable OADM using MEMS switch and FBG
Li, J. ; Liu, A.Q. ; Zhang, Q.X. ; Balasubramanian, N. ; Lu, C.
Pub. info.: Optical switching and optical interconnection II : APOC 2002 : Asia-Pacific Optical and Wireless Communications : 16-18 October, 2002, Shanghai, China.  pp.9-15,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4907