1.

Conference Proceedings
Conference Proceedings
1. High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Lang,R. ; Robinson,C.F. ; Medeiros,D.R. ; Petrillo,K.E. ; Aviram,A. ; Mahorowala,A.P. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M. ; Faure,T.B.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.268-277,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Simons,J.P. ; Angelopoulos,M. ; Patel,V. ; Grill,A. ; Halle,S. ; Conti,R. ; Wu,C.-H.J. ; Wise,R. ; Chen,L. ; Thomas,A.C. ; Lee,B. ; Mahorowala,A.P.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.306-316,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
3.

Conference Proceedings
Conference Proceedings
3. Patterning of hyperbranched resist materials by e-beam
Trimble,A.R. ; Tully,D.C. ; Frehet,J.M.J. ; Medeiros,D.R. ; Angelopoulos,M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1198-1201,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers
Sooriyakumaran,R. ; Fenzel-Alexander,D. ; Brock,P.J. ; Larson,C.E. ; DiPietro,R.A. ; Wallraff,G.M. ; Hofer,D.C. ; Dawson,D.J. ; Mahorowala,A.P. ; Angelopoulos,M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1171-1180,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Patterning of highly conducting polyaniline films
Graham,T.O. ; Afzali,A. ; Angelopoulos,M. ; Gelorme,J.D. ; Shaw,J.M.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.334-343,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
6.

Conference Proceedings
Conference Proceedings
6. CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making
Kwong,R.W. ; Huang,W.-S. ; Hartley,J.G. ; Moreau,W.M. ; Robinson,C. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.352-360,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
7.

Conference Proceedings
Conference Proceedings
7. Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
Ashe,B. ; Deverich,C. ; Rabidoux,P.A. ; Peck,B. ; Petrillo,K.E. ; Angelopoulos,M. ; Huang,W.-S. ; Moreau,W.M. ; Medeiros,D.R.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.664-672,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
8.

Conference Proceedings
Conference Proceedings
8. CA resist with high sensitivity and sub-100-nm resolution for advanced mask making
Huang,W.-S. ; Kwong,R.W. ; Hartley,J.G. ; Moreau,W.M. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.150-159,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
9.

Conference Proceedings
Conference Proceedings
9. Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications
Chey,S.J. ; Guarnieri,C.R. ; Babich,K. ; Pope,K.R. ; Goldfarb,D. ; Angelopoulos,M. ; Racette,K.C. ; Hibbs,M.S. ; Gibson,M.L. ; Kimmel,K.R.
Pub. info.: Optical Microlithography XIV.  4346  pp.798-805,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
10.

Conference Proceedings
Conference Proceedings
10. High-resolution patterning in chemically amplified resists: the effect of film thickness
Medeiros,D.R. ; Moreau,W.M. ; Petrillo,K.E. ; Chauhan,M. ; Huang,W.-S. ; Magg,C. ; Goldfarb,D. ; Angelopoulos,M. ; Nealey,P.F.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.241-250,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345