1.

Conference Proceedings
Conference Proceedings
1. Extension of 248-nm optical lithography: a thin film imaging approach
Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.278-288,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Conducting electron-beam resists based on polyaniline
Hupcey,M.A.Z. ; Angelopoulos,M. ; Gelorme,J.D. ; Ober,C.K.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.369-374,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
4.

Conference Proceedings
Conference Proceedings
4. New family of non-chemically amplified resists
Aviram,A. ; Angelopoulos,M. ; Babich,E.D. ; Babich,I.V. ; Petrillo,K. ; Seeger,D.E.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.349-358,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
5.

Conference Proceedings
Conference Proceedings
5. Pellicles for x-ray lithography masks
Maldonado,J.R. ; Cordes,S.A. ; Leavey,J.A. ; Acosta,R.E. ; Doany,F. ; Angelopoulos,M. ; Waskiewicz,C.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.245-254,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
6.

Conference Proceedings
Conference Proceedings
6. Effects of underlayer on performance of bilayer resists for 248-nm lithography
Babich,K. ; Callegari,A. ; Petrillo,K.E. ; Simons,J.P. ; LaTulipe,D.C.,Jr. ; Angelopoulos,M. ; Lin,Q.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.726-734,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
7.

Conference Proceedings
Conference Proceedings
7. Conducting polyaniline coatings for submicron lithography and SEM metrology
Graham,T.O. ; Angelopoulos,M. ; Furman,B. ; Chen,R.K.-J. ; Moreau,W.M.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.105-113,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
8.

Conference Proceedings
Conference Proceedings
8. Materials and modeling for organic light-emitting diodes
Scott,J.C. ; Carter,S.A. ; Karg,S. ; Angelopoulos,M.
Pub. info.: Light-Emitting Diodes: Research, Manufacturing, and Applications.  pp.86-91,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3002
9.

Conference Proceedings
Conference Proceedings
9. High-contrast positive resists for e-beam mask making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Angelopoulos,M. ; Bucchiagnano,J. ; Petrillo,K.E. ; Ito,H.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.400-408,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546