Mizoguchi, H. ; Endo, A. ; Arigo, T. ; Miura, T. ; Hoshino, H. ; Ueno, Y. ; Nakano, M. ; Komori, H. ; Sumitani, A. ; Abe, T. ; Suganuma, T. ; Soumagne, G. ; Someya, H. ; Takabayashi, Y. ; Toyoda, K.
Pub. info.:
Emerging Lithographic Technologies X. pp.61510S-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Abe, T. ; Fujii, A. ; Mohri, H. ; Hayashi, N. ; Tanaka, Y. ; Nishiyama, I.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62830H-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering