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16 results

Conference Proceedings

1. Novel polymer materials for optical waveguides and their applications to polymer CWDM devices (Invited Paper)

Itoh, Y. ; Hirano, K. ; Yasuda, H. ; Ushiwata, T. ; Abe, T.

Pub. info.:	Active and passive optical components for WDM communications IV : 25-28 October, 2004, Philadelphia, Pennsylvania, USA. pp.118-126, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5595

Conference Proceedings

2. High-average-power EUV light source for the next-generation lithography by laser-produced Xe plasma

Nakano, M. ; Abe, T. ; Endo, A.

Pub. info.:	X-ray sources and optics : 2-3 August 2004, Denver, Colorado, USA. pp.1-10, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5537

Conference Proceedings

3. Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography

Suganuma, T. ; Abe, T. ; Komori, H. ; Takabayashi, Y. ; Endo, A.

Pub. info.:	Fifth International Symposium on Laser Precision Microfabrication : 11-14 May, 2004, Nara, Japan. pp.367-372, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5662

Conference Proceedings

4. Experimental Determination of the Detonation Front Curvature of Non-Ideal Explosive ANFO

Miyake, A. ; Ohtagaki, Y. ; Abe, T. ; Wada, Y. ; Nakayama, Y. ; Ogawa, T.

Pub. info.:	Explosion, shock wave and hypervelocity phenomena in materials : proceedings of the 1st International Symposium on Explosion, Shock Wave and Hypervelocity Phenomena in Materials(ESHP Symposium), 15-17 March 2004, Kumamoto, Japan. pp.181-184, 2004. Zuerich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	465-466

Technical Paper

5. Reentry Heating Mitigation by Utilizing the Hall Effect

Otsu, H. ; Matsushita, K. ; Detlev, K. ; Abe, T. ; Funaki, I.

Pub. info.:	AIAA meeting papers on disc. 2004. [Reston, Va.]. American Institute of Aeronautics and Astronautics
Title of ser.:	AIAA Paper : AIAA Plasmadynamics and Lasers Conference
Ser. no.:	35th

Technical Paper

6. Development of New 2.2-liter Turbocharger Diesel Engine for the EURO-IV Standards.

Abe, T. ; Nagahiro, K. ; Aoki, T. ; Minami, H. ; Kikuchi, M.

Pub. info.:	2004 SAE world congress : technical paper. 2004. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2004

Technical Paper

7. Electro-Magnetic Effect on Shock Layer Structure in Reentry-Related High-Enthalpy Flow

Takizawa, Y. ; Sato, S. ; Abe, T. ; Konigorski, D.

Pub. info.:	AIAA meeting papers on disc. 2004. [Reston, Va.]. American Institute of Aeronautics and Astronautics
Title of ser.:	AIAA Paper : AIAA Plasmadynamics and Lasers Conference
Ser. no.:	35th

Conference Proceedings

8. Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Endo, A. ; Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Masaki, N. ; Soumagne, G. ; Komori, H. ; Takabayashi, Y. ; Mizoguchi, H.

Pub. info.:	Laser-generated and other laboratory X-ray and EUV sources, optics, and applications : 4-6 August 2003, San Diego, California, USA. pp.256-262, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5196

Conference Proceedings

9. Mask CD measurements with an atomic force microscope

Yoshida, Y. ; Sasaki, S. ; Abe, T. ; Mohri, H. ; Hayashi, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.759-769, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

10.

Conference Proceedings

10. Study of mask process development for EUVL

Abe, T. ; Nishiguchi, M. ; Amano, T. ; Motonaga, T. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Tanaka, Y. ; Yamanashi, H. ; Nishiyama, I.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.832-840, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

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