1.

Conference Proceedings
Conference Proceedings
1. Actinic aerial image measurement tool for 157-nm mask qualification
Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Engel, T. ; Zibold, A.M. ; Hertfelder, C. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Semmler, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.533-544,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Actinic aerial image measurement tool for 157-nm lithography
Kuschnerus, P. ; Engel, T. ; Zibold, A.M. ; Hertfelder, C. ; Yasui, T. ; Higashikawa, I. ; Schilz, C.M. ; Semmler, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.400-406,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Performance of the aerial image measurement system for 157-nm lithography
Kuschnerus, P. ; Engel, T. ; Harnisch, W. ; Hertfelder, C. ; Zibold, A.M. ; Urbach, J.-P. ; Schilz, C.M. ; Eisner, K.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.62-70,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
4.

Conference Proceedings
Conference Proceedings
4. Aerial image measurement system for 157-nm lithography
Eisner, K. ; Kuschnerus, P. ; Urbach, J.-P. ; Schilz, C.M. ; Engel, T. ; Zibold, A.M. ; Yasui, T. ; Higashikawa, I.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.469-477,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Aerial image measurement technique for automated reticle defect disposition (ARDD) in wafer fabs
Zibold, A.M. ; Schmid, R.M. ; Stegemann, B. ; Scheruebl, T. ; Harnisch, W. ; Kobiyama, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.728-736,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
6.

Conference Proceedings
Conference Proceedings
6. Actinic aerial image measurement for qualification of defect on 157-nm photomask
Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Degel, W. ; Boehm, K. ; Zibold, A.M. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Teuber Semmler, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.743-750,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
7.

Conference Proceedings
Conference Proceedings
7. First results from AIMS beta tool for 157-nm lithography
Teuber, S. ; Higashikawa, I. ; Urbach, J.-P. ; Schilz, C.M. ; Koehle, R. ; Zibold, A.M.
Pub. info.: Optical Microlithography XVII.  pp.1648-1657,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Aerial image measurement technique for fast evaluation of 193-nm lithography masks
Zibold, A.M. ; Scheruebl, T. ; Harnisch, W. ; Brunner, R. ; Greif, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1278-1285,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375