1.

Conference Proceedings
Conference Proceedings
1. Progress in 157-nm lithography development at Intel:resists and reticles
Rao,V. ; Panning,E.M. ; Liao,L. ; Hutchinson,J.M. ; Grenville,A. ; Holl,S.M. ; Bruner,D. ; Balasubramanian,R. ; Kuse,R. ; Dao,G.T. ; Zheng,J.-F. ; Orvek,K.J. ; Langston,J.C. ; Lo,F.-C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1574-1581,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Scanning Tunneling Microscopy of Si Donors in GaAs
Zheng,J.-F. ; Liu,X. ; Newman,N. ; Weber,E.R.
Pub. info.: Proceedings of the 17th International Conference on Defects in Semiconductors : ICDS-17, Gmunden, Austria, July 18-23, 1993.  Pt.3  pp.1319-1324,  1994.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 143-147
3.

Conference Proceedings
Conference Proceedings
3. NoVel Properties of Hydrogen-Containing Complexes Revealed by their Hydrogen Vibrations
Stavola,M. ; Zheng,J.-F. ; Cheng,Y.M. ; Abernathy,C.R. ; Pearton,S.J.
Pub. info.: Proceedings of the 18th International Conference on Defects in Semiconductors : ICDS-18, Sendai, Japan, July 23-28, 1995.  pp.809-816,  1995.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 196-201
4.

Conference Proceedings
Conference Proceedings
4. Decay kinetics of growth-iuduced alignment of the first neighbor shell of CAs in AlxGa1-xAs
Zhou,J.A. ; Song,C.Y. ; Zheng,J.-F. ; Stavola,M. ; Abemathy,C.R. ; Pearton,S.J.
Pub. info.: Defects in semiconductors, icds-19 : proceedings of the 19th International Conference on Defects in Semiconductors, Aveiro, Portugal, July 1997.  Part3  pp.1293-1298,  1997.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 258-263
5.

Conference Proceedings
Conference Proceedings
5. Localized resist heating due to electron-beam patterning during photomask fabrication
Wei,A.C. ; Beckman,W.A. ; Engelstad,R.L. ; Mitchell,J.W. ; Phung,T.N. ; Zheng,J.-F.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.482-493,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. Pellicle-induced distortions in advanced optical reticles
Semke,W.H. ; Siewert,L.K. ; Mikkelson,A.R. ; Risius,E.A. ; Tang,N. ; Engelstad,R.L. ; Lovell,E.G. ; Zheng,J.-F. ; Dao,G.T.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.207-216,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
7.

Conference Proceedings
Conference Proceedings
7. Impact of surface contamination on transmittance of modified fused silica for 157-nm lithography application
Zheng,J.-F. ; Kuse,R. ; Ramamoorthy,A. ; Dao,G.T. ; Lo,F.-C.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.767-773,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
8.

Conference Proceedings
Conference Proceedings
8. Mechanical analysis of hard pellicles for 157-nm lithography
Reu,P.L. ; Mikkelson,A.R. ; Schlax,M.P. ; Cotte,E.P. ; Siewert,L.K. ; Engelstad,R.L. ; Lovell,E.G. ; Dao,G.T. ; Zheng,J.-F.
Pub. info.: Optical Microlithography XIV.  4346  pp.1166-1174,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346