1.

Conference Proceedings
Conference Proceedings
1. New mask blank handling system for the advanced electron-beam writer
Yoshitake,S. ; Ooki,K. ; Hirano,R. ; Tojo,T. ; Ogawa,Y. ; Ogura,K. ; Yamamoto,T. ; Toriumi,M. ; Tada,Y.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.905-915,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Development of an in-situ cleaning system for an e-beam reticle writer
Ohtoshi,K. ; Yamasaki,S. ; Tamamushi,S. ; Tojo,T. ; Hirano,R. ; Fukudome,Y. ; Shimomura,N. ; Nishimura,S. ; Yoshitake,S. ; Ogasawara,M.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.68-71,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
3.

Conference Proceedings
Conference Proceedings
3. Eddy current evalution for a high-resolution EB system
Shimomura,N. ; Ogasawara,M. ; Hattori,K. ; Takamastsu,J. ; Sunaoshi,H. ; Yoshitake,S. ; Fukudome,Y. ; Akeno,K.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.460-467,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
4.

Conference Proceedings
Conference Proceedings
4. Writing accuracy of EBM-3500 electron-beam mask writing system
Ohtoshi,K. ; Sunaoshi,H. ; Takamatsu,J. ; Okabe,F. ; Ishibashi,K. ; Yoshitake,S. ; Yamada,H. ; Tamamushi,S. ; Anze,H. ; Kamikobo,T. ; Ogawa,Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.238-247,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
5.

Conference Proceedings
Conference Proceedings
5. Stage tracking of a mask-scan EB mask writer test stand
Nishimura,S. ; Mitsui,S. ; Ogasawara,M. ; Akeno,K. ; Shimizu,M. ; Kusakabe,H. ; Wada,H. ; Hattori,K. ; Yoshitake,S. ; Simomura,N. ; Takamatsu,J. ; Sunaoshi,H. ; Fukudome,Y. ; Tojo,T. ; Tsuchiya,S.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.503-510,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
6.

Conference Proceedings
Conference Proceedings
6. Practical approach to evaluating mask CD uniformity patterned by a variable-shaped beam
Yoshitake,S. ; Ogawa,Y. ; Sakurai,H. ; Itoh,M. ; Higashikawa,I. ; Nakayamada,N. ; Matsuki,K. ; Tamamushi,S.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.293-300,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
7.

Conference Proceedings
Conference Proceedings
7. Pattern shift error induced by coating and developing
Yoshitake,S. ; Matsuki,K. ; Hirano,R. ; Tojo,T.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.43-52,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793