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17 results

Conference Proceedings

1. Simulation and optimization of a smart reconfigurable aperture antenna

Washington, G.N. ; Yoon, H.-S. ; Theunissen, W.H.

Pub. info.:	Smart structures and materials 2002 : smart electronics, MEMS, and nanotechnology : 18-21 March 2002, San Diego, USA. pp.222-233, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4700

Conference Proceedings

2. A novel focus monitoring method using double side chrome mask

Cha, B.-C. ; Kim, Y.-H. ; Yoon, H.-S. ; Han, W.-S.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.303-314, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Technical Paper

3. A Study of Crack Propagation Characteristic for Inner Belt-Layer in TBR Tire.

Lim, D.-J. ; Yoon, H.-S.

Pub. info.:	2004 SAE world congress : technical paper. 2004. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2004

Technical Paper

4. An Optimal Powertrain Control Strategy for a Mild hybrid Electric Vehicle.

McGehee, J. ; Yoon, H.-S.

Pub. info.:	2013 SAE world congress : technical paper. 2013. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2013

Conference Proceedings

5. Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11]

Yu, S.-Y. ; Kim, S.-H. ; Cha, B.-C. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.83-89, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

6. Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask

Park, J.R. ; Kim, S.H. ; Yeo, G.-S. ; Choi, S.-W. ; Ki, W.-T. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	Optical Microlithography XVI. Part One pp.553-560, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

7. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.107-117, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. Study of characteristics and control of haze contamination induced by photochemical reaction

Han, S.-J. ; Yu, S.-Y. ; Sung, M.-G. ; Kim, Y.-H. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.563-567, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

9. Analytical approach to X-phenomenon in alternating phase-shifting masks

Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1209-1216, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

10.

Conference Proceedings

10. PSM defect printability of extremely low-k1 sub-130-nm KrF lithography

Cho, W.-I. ; Yeo, G. ; Moon, S.-Y. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1202-1208, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

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Author: Yoon, H.-S.