1.

Conference Proceedings

Conference Proceedings
Taniguchi, M. ; Yasuda, S. ; Ishii, Y. ; Murata, T. ; Hidai, M. ; Tatsumi, T.
Pub. info.: 11th International Congress on Catalysis, 40th anniversary : Proceedings of the 11th ICC, Baltimore, MD, USA, June 30-July 5, 1996.  Part A  pp.107-,  1996.  New York.  Elsevier
Title of ser.: Studies in surface science and catalysis
Ser. no.: 101
2.

Conference Proceedings

Conference Proceedings
Mukouyama, M. ; Yasuda, S.
Pub. info.: Science and technology in catalysis 2002 : proceedings of the Fourth Tokyo Conference on Advanced Catalytic Science and Technology, Tokyo, July 14-19, 2002.  pp.553-554,  2003.  Amsterdam.  Elsevier
Title of ser.: Studies in surface science and catalysis
Ser. no.: 145
3.

Technical Paper

Technical Paper
Iwakoshi, M. ; Yasuda, S. ; Kobayashi, M. ; MIto, M. ; Kanai, S.
Pub. info.: S.M.E. technical paper.  2006.  Dearborn, Mich..  Society of Manufacturing Engineers
Title of ser.: SME Technical Paper : TP
Ser. no.: 2006
4.

Conference Proceedings

Conference Proceedings
Sakurai, H. ; Itoh, M. ; Fujiwara, N. ; Yasuda, S. ; Ishimura, T. ; Wakayama, S. ; Ito, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.274-281,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
5.

Conference Proceedings

Conference Proceedings
Hattori, Y. ; Hattori, K. ; Murooka, K. ; Abe, T. ; Yasuda, S. ; Uno, T. ; Murakami, E. ; Nakayamada, N. ; Shimomura, N. ; Yamashita, T. ; Yamada, N. ; Sakai, A. ; Honda, H. ; Shimoyama, T. ; Nakaso, K. ; Inoue, H. ; Onimaru, Y. ; Makiyama, K. ; Ogawa, Y. ; Takigawa, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.697-704,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
6.

Conference Proceedings

Conference Proceedings
Tojo, T. ; Yoshikawa, R. ; Ogawa, Y. ; Tamamushi, S. ; Hattori, Y. ; Koikari, S. ; Kusakabe, H. ; Abe, T. ; Ogasawara, M. ; Akeno, K. ; Anze, H. ; Hattori, K. ; Hirano, R. ; Yoshitake, S. ; Iijima, T. ; Ohtoshi, K. ; Matsuki, K. ; Shimomura, N. ; Yamada, N. ; Higurashi, H. ; Nakayamada, N. ; Fukudome, Y. ; Hara, S. ; Murakami, E. ; Kamikubo, T. ; Suzuki, Y. ; Oogi, S. ; Shimizu, M. ; Nishimura, S. ; Tsurumaki, H. ; Yasuda, S. ; Ooki, K. ; Koyama, K. ; Watanabe, S. ; Yano, M. ; Suzuki, H. ; Hoshino, H. ; Toriumi, M. ; Watanabe, O. ; Tsuji, K. ; Katayama, M. ; Tsuchiya, S. ; Suzuki, K. ; Kurasawa, S. ; Okuzono, K. ; Yamada, H. ; Handa, K. ; Suzuki, Y. ; Akiyama, T. ; Tada, Y. ; Noma, A. ; Takigawa, T.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.416-425,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
7.

Technical Paper

Technical Paper
Iwakoshi, M. ; Yasuda, S. ; Kobayashi, M. ; Mito, M. ; Kanai, S.
Pub. info.: SME technical paper.  2005.  Society of Manufacturing Engineers